MCN10 Megasonic Cleaning System for Laboratory Wafer Cleaning

The MCN10 Megasonic Cleaning System is a compact and versatile laboratory cleaning solution designed for precision wafer cleaning, semiconductor research, and advanced surface cleaning applications. The system integrates an adjustable-frequency megasonic cleaning nozzle with a modular power generator, providing flexible cleaning performance for different substrate materials and process requirements.

Using high-frequency acoustic energy, the MCN10 generates controlled megasonic waves in liquid environments to enhance particle removal and surface cleaning efficiency. Compared with conventional ultrasonic cleaning technologies, megasonic cleaning provides more precise acoustic control, making it suitable for delicate substrates where minimizing surface damage is critical.

The MCN10 supports multiple operating frequencies, including 470 kHz and 1 MHz, allowing users to select the optimal cleaning frequency according to different applications. Depending on the selected frequency configuration, modular generators are available with output power options from 200 W up to 2 kW, providing scalable cleaning capability from laboratory experiments to more demanding research applications.

With its compact design, flexible configuration, and easy integration capability, MCN10 is ideal for universities, research institutes, semiconductor laboratories, MEMS development, and customized wafer cleaning platforms.

Key Features

Adjustable Megasonic Frequency

The MCN10 supports selectable megasonic frequencies of:

• 470 kHz
• 1 MHz

Different frequency options allow optimization of cleaning performance for various wafer sizes, materials, and contamination conditions.

Modular Power Configuration

The system is equipped with modular megasonic generators with configurable output power:

• 200 W laboratory configuration
• Up to 2 kW high-power configuration

Users can select the appropriate power level according to cleaning requirements and application scale.

Precision Wafer Cleaning Performance

The MCN10 provides efficient removal of:

• Fine particles
• Surface residues
• Organic contaminants
• Process-related contamination

while maintaining gentle cleaning conditions for sensitive substrates.

Flexible Laboratory Integration

Designed for R&D environments, the MCN10 can be integrated into:

• Laboratory wafer cleaning stations
• Semiconductor process development platforms
• Customized cleaning chambers
• Material research systems

Technical Specifications

Typical Applications

Semiconductor Wafer Cleaning

Suitable for laboratory-scale wafer cleaning processes, including silicon wafer and semiconductor substrate preparation.

MEMS and Microfabrication Research

Provides controlled megasonic cleaning for delicate microstructures and advanced fabrication processes.

Optical and Precision Component Cleaning

Applicable for cleaning sensitive optical components and high-value precision parts.

Surface Processing Research

Ideal for universities, research institutions, and industrial laboratories developing advanced cleaning technologies.

Product Package Includes

• MCN10 Megasonic Cleaning System
• Megasonic Cleaning Nozzle
• Modular Megasonic Generator
• Power Cable
• Connection Accessories
• User Manual