MCU10 Megasonic Cleaning Nozzle Unit

The MCU10 Megasonic Cleaning Nozzle Unit is a compact laboratory-grade megasonic cleaning accessory designed for precision wafer cleaning and advanced surface cleaning applications. The system integrates a high-frequency megasonic nozzle and dedicated power control unit, providing a flexible solution for research laboratories, universities, and semiconductor process development.

Featuring adjustable operating frequency and controllable megasonic energy output, MCU10 enables users to optimize cleaning conditions for different substrates, materials, and process requirements. The megasonic nozzle generates high-frequency acoustic energy in liquid media, producing enhanced fluid streaming effects to assist in removing fine particles and surface contaminants while minimizing damage to delicate surfaces.

With its compact structure and easy integration, MCU10 can be installed into customized cleaning setups, experimental cleaning stations, and small-scale wafer processing platforms. The unit is suitable for applications including semiconductor wafer cleaning, MEMS research, optical component cleaning, and other precision cleaning processes.

Key Features

• Integrated megasonic cleaning nozzle and electronic control unit
• Adjustable megasonic frequency for different cleaning requirements
• Compact design for laboratory and R&D environments
• Compatible with various wafer cleaning and precision cleaning platforms
• High-frequency acoustic cleaning with reduced mechanical impact
• Suitable for semiconductor, MEMS, optics, and microfabrication research

Applications

• Semiconductor wafer cleaning
• MEMS device cleaning
• Photomask and substrate cleaning
• Optical component cleaning
• Precision laboratory cleaning processes
• Research and process development

Product Includes

• Megasonic Cleaning Nozzle Unit
• Power Generator / Control Box
• Connection Cable Set
• User Operation Manual