{"product_id":"megasonic-cleaning-system","title":"MCN10 Megasonic Cleaning System","description":"\u003cp\u003e\u003cstrong\u003eMCN10 Megasonic Cleaning System for Laboratory Wafer Cleaning\u003c\/strong\u003e\u003c\/p\u003e\n\u003cp dir=\"auto\" data-start=\"549\" data-end=\"951\" class=\"PDq2pG_selectionAnchorContainer\"\u003eThe MCN10 Megasonic Cleaning System is a compact and versatile laboratory cleaning solution designed for precision wafer cleaning, semiconductor research, and advanced surface cleaning applications. The system integrates an adjustable-frequency megasonic cleaning nozzle with a modular power generator, providing flexible cleaning performance for different substrate materials and process requirements.\u003cspan class=\"PDq2pG_selectionAnchor\"\u003e\u003c\/span\u003e\u003c\/p\u003e\n\u003cp dir=\"auto\" data-start=\"953\" data-end=\"1329\"\u003eUsing high-frequency acoustic energy, the MCN10 generates controlled megasonic waves in liquid environments to enhance particle removal and surface cleaning efficiency. Compared with conventional ultrasonic cleaning technologies, megasonic cleaning provides more precise acoustic control, making it suitable for delicate substrates where minimizing surface damage is critical.\u003c\/p\u003e\n\u003cp dir=\"auto\" data-start=\"1331\" data-end=\"1752\"\u003eThe MCN10 supports multiple operating frequencies, including \u003cstrong data-start=\"1392\" data-end=\"1413\"\u003e470 kHz and 1 MHz\u003c\/strong\u003e, allowing users to select the optimal cleaning frequency according to different applications. Depending on the selected frequency configuration, modular generators are available with output power options from \u003cstrong data-start=\"1623\" data-end=\"1643\"\u003e200 W up to 2 kW\u003c\/strong\u003e, providing scalable cleaning capability from laboratory experiments to more demanding research applications.\u003c\/p\u003e\n\u003cp dir=\"auto\" data-start=\"1754\" data-end=\"1976\"\u003eWith its compact design, flexible configuration, and easy integration capability, MCN10 is ideal for universities, research institutes, semiconductor laboratories, MEMS development, and customized wafer cleaning platforms.\u003c\/p\u003e\n\u003chr data-start=\"1978\" data-end=\"1981\"\u003e\n\u003ch1 data-section-id=\"u0ybrq\" dir=\"auto\" data-start=\"1983\" data-end=\"1997\"\u003eKey Features\u003c\/h1\u003e\n\u003ch3 data-section-id=\"1oqzicj\" dir=\"auto\" data-start=\"1999\" data-end=\"2033\"\u003eAdjustable Megasonic Frequency\u003c\/h3\u003e\n\u003cp dir=\"auto\" data-start=\"2035\" data-end=\"2090\"\u003eThe MCN10 supports selectable megasonic frequencies of:\u003c\/p\u003e\n\u003cul data-start=\"2092\" data-end=\"2117\"\u003e\n\u003cli data-section-id=\"w82yf6\" data-start=\"2092\" data-end=\"2105\"\u003e\u003cstrong data-start=\"2094\" data-end=\"2105\"\u003e470 kHz\u003c\/strong\u003e\u003c\/li\u003e\n\u003cli data-section-id=\"jk5a6e\" data-start=\"2106\" data-end=\"2117\"\u003e\u003cstrong data-start=\"2108\" data-end=\"2117\"\u003e1 MHz\u003c\/strong\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp dir=\"auto\" data-start=\"2119\" data-end=\"2255\"\u003eDifferent frequency options allow optimization of cleaning performance for various wafer sizes, materials, and contamination conditions.\u003c\/p\u003e\n\u003chr data-start=\"2257\" data-end=\"2260\"\u003e\n\u003ch3 data-section-id=\"146vlz9\" dir=\"auto\" data-start=\"2262\" data-end=\"2293\"\u003eModular Power Configuration\u003c\/h3\u003e\n\u003cp dir=\"auto\" data-start=\"2295\" data-end=\"2383\"\u003eThe system is equipped with modular megasonic generators with configurable output power:\u003c\/p\u003e\n\u003cul data-start=\"2385\" data-end=\"2463\"\u003e\n\u003cli data-section-id=\"knfece\" data-start=\"2385\" data-end=\"2421\"\u003e\u003cstrong data-start=\"2387\" data-end=\"2421\"\u003e200 W laboratory configuration\u003c\/strong\u003e\u003c\/li\u003e\n\u003cli data-section-id=\"15p6avo\" data-start=\"2422\" data-end=\"2463\"\u003e\u003cstrong data-start=\"2424\" data-end=\"2463\"\u003eUp to 2 kW high-power configuration\u003c\/strong\u003e\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp dir=\"auto\" data-start=\"2465\" data-end=\"2567\"\u003eUsers can select the appropriate power level according to cleaning requirements and application scale.\u003c\/p\u003e\n\u003chr data-start=\"2569\" data-end=\"2572\"\u003e\n\u003ch3 data-section-id=\"uyxq3u\" dir=\"auto\" data-start=\"2574\" data-end=\"2614\"\u003ePrecision Wafer Cleaning Performance\u003c\/h3\u003e\n\u003cp dir=\"auto\" data-start=\"2616\" data-end=\"2656\"\u003eThe MCN10 provides efficient removal of:\u003c\/p\u003e\n\u003cul data-start=\"2658\" data-end=\"2748\"\u003e\n\u003cli data-section-id=\"1a9ektn\" data-start=\"2658\" data-end=\"2674\"\u003eFine particles\u003c\/li\u003e\n\u003cli data-section-id=\"12wselz\" data-start=\"2675\" data-end=\"2693\"\u003eSurface residues\u003c\/li\u003e\n\u003cli data-section-id=\"jvw82q\" data-start=\"2694\" data-end=\"2716\"\u003eOrganic contaminants\u003c\/li\u003e\n\u003cli data-section-id=\"3f0kw1\" data-start=\"2717\" data-end=\"2748\"\u003eProcess-related contamination\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003cp dir=\"auto\" data-start=\"2750\" data-end=\"2820\"\u003ewhile maintaining gentle cleaning conditions for sensitive substrates.\u003c\/p\u003e\n\u003chr data-start=\"2822\" data-end=\"2825\"\u003e\n\u003ch3 data-section-id=\"3d901a\" dir=\"auto\" data-start=\"2827\" data-end=\"2862\"\u003eFlexible Laboratory Integration\u003c\/h3\u003e\n\u003cp dir=\"auto\" data-start=\"2864\" data-end=\"2928\"\u003eDesigned for R\u0026amp;D environments, the MCN10 can be integrated into:\u003c\/p\u003e\n\u003cul data-start=\"2930\" data-end=\"3071\"\u003e\n\u003cli data-section-id=\"17b1t4w\" data-start=\"2930\" data-end=\"2966\"\u003eLaboratory wafer cleaning stations\u003c\/li\u003e\n\u003cli data-section-id=\"1nmyzrr\" data-start=\"2967\" data-end=\"3012\"\u003eSemiconductor process development platforms\u003c\/li\u003e\n\u003cli data-section-id=\"1vbsvd9\" data-start=\"3013\" data-end=\"3043\"\u003eCustomized cleaning chambers\u003c\/li\u003e\n\u003cli data-section-id=\"43d73g\" data-start=\"3044\" data-end=\"3071\"\u003eMaterial research systems\u003c\/li\u003e\n\u003c\/ul\u003e\n\u003chr data-start=\"3073\" data-end=\"3076\"\u003e\n\u003ch1 data-section-id=\"zjxypn\" dir=\"auto\" data-start=\"3078\" data-end=\"3104\"\u003eTechnical Specifications\u003c\/h1\u003e\n\u003cdiv dir=\"auto\" class=\"group TyagGW_tableContainer\"\u003e\n\u003cdiv class=\"TyagGW_tableWrapper flex flex-col-reverse w-fit\" tabindex=\"-1\"\u003e\n\u003ctable data-start=\"3106\" data-end=\"3856\" dir=\"auto\" class=\"w-fit min-w-(--thread-content-width)\"\u003e\n\u003cthead data-start=\"3106\" data-end=\"3135\"\u003e\n\u003ctr data-start=\"3106\" data-end=\"3135\"\u003e\n\u003cth data-start=\"3106\" data-end=\"3118\" data-col-size=\"sm\" class=\"last:pe-10\"\u003eParameter\u003c\/th\u003e\n\u003cth data-start=\"3118\" data-end=\"3135\" data-col-size=\"md\" class=\"last:pe-10\"\u003eSpecification\u003c\/th\u003e\n\u003c\/tr\u003e\n\u003c\/thead\u003e\n\u003ctbody data-start=\"3146\" data-end=\"3856\"\u003e\n\u003ctr data-start=\"3146\" data-end=\"3171\"\u003e\n\u003ctd data-start=\"3146\" data-end=\"3162\" data-col-size=\"sm\"\u003eProduct Model\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3162\" data-end=\"3171\"\u003eMCN10\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3172\" data-end=\"3218\"\u003e\n\u003ctd data-start=\"3172\" data-end=\"3189\" data-col-size=\"sm\"\u003eEquipment Type\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3189\" data-end=\"3218\"\u003eMegasonic Cleaning System\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3219\" data-end=\"3291\"\u003e\n\u003ctd data-start=\"3219\" data-end=\"3233\" data-col-size=\"sm\"\u003eApplication\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3233\" data-end=\"3291\"\u003eLaboratory Wafer Cleaning \/ Precision Surface Cleaning\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3292\" data-end=\"3335\"\u003e\n\u003ctd data-start=\"3292\" data-end=\"3316\" data-col-size=\"sm\"\u003eAvailable Frequencies\u003c\/td\u003e\n\u003ctd data-start=\"3316\" data-end=\"3335\" data-col-size=\"md\"\u003e470 kHz \/ 1 MHz\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3336\" data-end=\"3397\"\u003e\n\u003ctd data-start=\"3336\" data-end=\"3359\" data-col-size=\"sm\"\u003eFrequency Adjustment\u003c\/td\u003e\n\u003ctd data-start=\"3359\" data-end=\"3397\" data-col-size=\"md\"\u003eSelectable frequency configuration\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3398\" data-end=\"3446\"\u003e\n\u003ctd data-start=\"3398\" data-end=\"3415\" data-col-size=\"sm\"\u003eGenerator Type\u003c\/td\u003e\n\u003ctd data-start=\"3415\" data-end=\"3446\" data-col-size=\"md\"\u003eModular Megasonic Generator\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3447\" data-end=\"3484\"\u003e\n\u003ctd data-start=\"3447\" data-end=\"3468\" data-col-size=\"sm\"\u003eOutput Power Range\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3468\" data-end=\"3484\"\u003e200 W – 2 kW\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3485\" data-end=\"3538\"\u003e\n\u003ctd data-start=\"3485\" data-end=\"3507\" data-col-size=\"sm\"\u003eCleaning Technology\u003c\/td\u003e\n\u003ctd data-start=\"3507\" data-end=\"3538\" data-col-size=\"md\"\u003eMegasonic Acoustic Cleaning\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3539\" data-end=\"3580\"\u003e\n\u003ctd data-start=\"3539\" data-end=\"3560\" data-col-size=\"sm\"\u003eCleaning Component\u003c\/td\u003e\n\u003ctd data-start=\"3560\" data-end=\"3580\" data-col-size=\"md\"\u003eMegasonic Nozzle\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3581\" data-end=\"3623\"\u003e\n\u003ctd data-start=\"3581\" data-end=\"3598\" data-col-size=\"sm\"\u003eControl Method\u003c\/td\u003e\n\u003ctd data-start=\"3598\" data-end=\"3623\" data-col-size=\"md\"\u003eDigital Power Control\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3624\" data-end=\"3675\"\u003e\n\u003ctd data-start=\"3624\" data-end=\"3644\" data-col-size=\"sm\"\u003eInstallation Type\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3644\" data-end=\"3675\"\u003eLaboratory Bench-top System\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3676\" data-end=\"3782\"\u003e\n\u003ctd data-start=\"3676\" data-end=\"3699\" data-col-size=\"sm\"\u003eCompatible Materials\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3699\" data-end=\"3782\"\u003eSilicon wafers, glass substrates, semiconductor materials, precision components\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003ctr data-start=\"3783\" data-end=\"3856\"\u003e\n\u003ctd data-start=\"3783\" data-end=\"3803\" data-col-size=\"sm\"\u003eApplication Scale\u003c\/td\u003e\n\u003ctd data-col-size=\"md\" data-start=\"3803\" data-end=\"3856\"\u003eResearch and Development \/ Small Batch Processing\u003c\/td\u003e\n\u003c\/tr\u003e\n\u003c\/tbody\u003e\n\u003c\/table\u003e\n\u003c\/div\u003e\n\u003c\/div\u003e\n\u003chr data-start=\"3858\" data-end=\"3861\"\u003e\n\u003ch1 data-section-id=\"bazihh\" dir=\"auto\" data-start=\"3863\" data-end=\"3885\"\u003eTypical Applications\u003c\/h1\u003e\n\u003ch2 data-section-id=\"17qp1nw\" dir=\"auto\" data-start=\"3887\" data-end=\"3918\"\u003eSemiconductor Wafer Cleaning\u003c\/h2\u003e\n\u003cp dir=\"auto\" data-start=\"3920\" data-end=\"4040\"\u003eSuitable for laboratory-scale wafer cleaning processes, including silicon wafer and semiconductor substrate preparation.\u003c\/p\u003e\n\u003ch2 data-section-id=\"fwk4nv\" dir=\"auto\" data-start=\"4042\" data-end=\"4079\"\u003eMEMS and Microfabrication Research\u003c\/h2\u003e\n\u003cp dir=\"auto\" data-start=\"4081\" data-end=\"4184\"\u003eProvides controlled megasonic cleaning for delicate microstructures and advanced fabrication processes.\u003c\/p\u003e\n\u003ch2 data-section-id=\"1op00ce\" dir=\"auto\" data-start=\"4186\" data-end=\"4229\"\u003eOptical and Precision Component Cleaning\u003c\/h2\u003e\n\u003cp dir=\"auto\" data-start=\"4231\" data-end=\"4315\"\u003eApplicable for cleaning sensitive optical components and high-value precision parts.\u003c\/p\u003e\n\u003ch2 data-section-id=\"1mi95uq\" dir=\"auto\" data-start=\"4317\" data-end=\"4347\"\u003eSurface Processing Research\u003c\/h2\u003e\n\u003cp dir=\"auto\" data-start=\"4349\" data-end=\"4466\"\u003eIdeal for universities, research institutions, and industrial laboratories developing advanced cleaning technologies.\u003c\/p\u003e\n\u003chr data-start=\"4468\" data-end=\"4471\"\u003e\n\u003ch1 data-section-id=\"z2z988\" dir=\"auto\" data-start=\"4473\" data-end=\"4499\"\u003eProduct Package Includes\u003c\/h1\u003e\n\u003cul data-start=\"4501\" data-end=\"4645\"\u003e\n\u003cli data-section-id=\"qwrrrz\" data-start=\"4501\" data-end=\"4534\"\u003eMCN10 Megasonic Cleaning System\u003c\/li\u003e\n\u003cli data-section-id=\"1nk39n7\" data-start=\"4535\" data-end=\"4562\"\u003eMegasonic Cleaning Nozzle\u003c\/li\u003e\n\u003cli data-section-id=\"vdb2pt\" data-start=\"4563\" data-end=\"4592\"\u003eModular Megasonic Generator\u003c\/li\u003e\n\u003cli data-section-id=\"m9yum6\" data-start=\"4593\" data-end=\"4606\"\u003ePower Cable\u003c\/li\u003e\n\u003cli data-section-id=\"1h1mq54\" data-start=\"4607\" data-end=\"4631\"\u003eConnection Accessories\u003c\/li\u003e\n\u003cli data-section-id=\"10sdtyb\" data-start=\"4632\" data-end=\"4645\"\u003eUser Manual\u003c\/li\u003e\n\u003c\/ul\u003e","brand":"Sonic4Lab","offers":[{"title":"Default Title","offer_id":67602965790971,"sku":null,"price":25900.0,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0688\/2358\/0923\/files\/MegasonicCleaning-2.png?v=1790754810","url":"https:\/\/sonic4lab.com\/products\/megasonic-cleaning-system","provider":"Sonic4Lab","version":"1.0","type":"link"}